Overview

Deep X-ray lithography (DXRL) allows the production of high aspect ratio three dimensional structures in polymer with quasi perfect side-wall verticality and optical quality roughness. These structures can then be used as templates to mass-produce microparts made out of a large variety of metals, alloys or ceramics. The technique used to fabricate these parts is called LIGA.

It opens a wide variety of potential applications in the field of microelectromechanical systems (MEMs), fibre and integrated optics, microfluidic devices and interconnection technology. Moreover, the beamline performs an irradiaiton of samples with controlled X-ray doses, allowing therefore material science studies and the fabrication of microdevices made of new materials.

More details are given in the this info-folder:  ELETTRA_DXRL_BROCHURE.pdf 

 

Specifications


 Type

Bending Magnet

 Energy Range

0-20 keV

 Source Size

sx = 0.371 mm

sy = 0.043 mm

sy' = 14 mrad

 Beam vertical divergence

 < 0.5 mrad

 Beam horizontal  divergence            

 <    5 mrad

 

 

Industrial Applications

 

Research Application

 

 DXRL-Publications

 

Person responsible:

Heinz Amenitsch

Tel: +39-040-375-8044 (office at ELETTRA) or -8363 (beamline)

Tel: +43-316-873-32145 (office at TU-Graz)

e-mail: heinz.amenitsch@elettra.eu


Benedetta Marmiroli

Tel: +39-040-375- 8708  or -8076

e-mail: benedetta.marmiroli@elettra.eu



Location of the lab

Elettra-Sincrotrone Trieste S.C.p.A. di interesse nazionale, 34149 Basovizza (TS), SS 14, Km 163.5 (Italien)

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